| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a protective solution for a photomask excellent in handleability and in adhesion to an emulsion layer when used as a protective film. SOLUTION: The protective solution for a photomask is used for forming a protective film on the emulsion layer of the photomask having the emulsion layer with a formed pattern for exposure on a substrate and consists of a polyol, a blocked polyisocyanate and a solvent.</p> |
