发明名称 SEMICONDUCTOR MEMORY AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an arrangement for suppressing the stripping of a lower electrode of a ferroelectric capacitive element in a region above a plug during the deposition of a PZT film or subsequent heat treatment, and a method for manufacturing a semiconductor memory. SOLUTION: A three-layer film of first metal, a metal nitride film and second metal is formed beneath the lower electrode of the ferroelectric capacitive element wherein the metal nitride film is composed of a nitride of the first or second metal.
申请公布号 JP2002280523(A) 申请公布日期 2002.09.27
申请号 JP20010075485 申请日期 2001.03.16
申请人 NEC CORP 发明人 SHINOHARA SOTA;TAKEMURA KOICHI;TSUJITA YASUHIRO;MORI HIDEMITSU
分类号 H01L21/28;H01L21/02;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L27/115 主分类号 H01L21/28
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