发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM RESIST USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in workability and adhesiveness, having satisfactory mechanical strength after curing and excellent in heat resistance, to provide a photosensitive dry film resist using the composition and to provide a photosensitive cover lay film laminated board obtained by laminating the dry film resist on a printed board and exhibiting good solid state properties. SOLUTION: The photosensitive resin composition contains (A) a soluble polyimide having a COOH equivalent of 200-3,000, (B) a polyfunctional (meth) acrylic compound and/or its analogue and (C) a photoreaction initiator.
申请公布号 JP2002278065(A) 申请公布日期 2002.09.27
申请号 JP20010078201 申请日期 2001.03.19
申请人 KANEGAFUCHI CHEM IND CO LTD 发明人 OKADA YOSHIFUMI;KOKAWARA KAORU
分类号 G03F7/037;C08F2/44;C08F2/48;C08F283/04;C08G73/10;G03F7/004;G03F7/075;H05K3/28 主分类号 G03F7/037
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