摘要 |
PROBLEM TO BE SOLVED: To provide the manufacturing device of a semiconductor, capable of accurately calibrating the sensitivity fluctuations of manometer by pressure fluctuation, measuring accurate pressure in various pressure ranges and performing a manufacturing processing. SOLUTION: At periodical inspections, the inside of the manometer 106 and a processing chamber 102 is evacuated and turned to a high vacuum state which is equal to or below the measurement sensitivity of the manometer 106. The zero point of the manometer 106 is corrected, a valve 101 is opened and an inactive gas is introduced to the processing chamber 100. The pressure is measured by the monometer 106, and introduction of 12 Pa is performed. The valve 101 or the like is closed, the processing chamber 102 is evacuated to the high-vacuum state and the valve 105 is closed completely. Then, the valve 107 is opened and the gas sealed inside the manometer is discharged into the processing chamber 102. The pressure at the time is measured by the manometer 106, and a sensitivity degradation coefficient k in a prescribed calibration formula is calculated from the volume or the like of the processing chamber 102 and a measured value. The measured value to be sent from the manometer 106 to a system controller 110 is calibrated by using the prescribed calibration formula, the value is defined as a true value and the pressure inside the processing chamber 102 is controlled.
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