MANUFACTURING METHOD OF ELECTRON EMISSION ELEMENT, ELECTRON EMISSION ELEMENT, CHARGING DEVICE AND IMAGE FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce manufacturing cost of an electron emission element. SOLUTION: A semiconductor layer 13, an insulating layer 11 and a thin film electrode 12 are laminated sequentially, and an electron emission element A emitting electron is manufactured by applying voltage. Manufacture of the semiconductor layer 13 and the insulating layer 11 is done by forming fine-grain silicon on a substrate with fine-grain spray method. With this, the semiconductor layer 13 is formed as a silicon film, and the insulating layer 11 is formed as an oxidized or nitrided film of silicon.