发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having low Dmin (fog), high Dmax (maximum density) and ultrahigh contrast, generating no black spots, less liable to increase Dmin after heat development and optimum for use in a photomechanical process. SOLUTION: In the heat developable photosensitive material having at least a non-photosensitive organic silver salt, photosensitive silver halide, a reducing agent for silver ions, a nucleus forming agent and a binder on the base, a benzotriazole derivative of formula (1) (where R<1> is a <=20C alkyl or alkenyl, a <=20C aryl, alkaryl or aralkyl, a 3- to 6-membered aliphatic heterocyclic group, a 3- to 6-membered aromatic heterocyclic group or a 3-to 6-membered aliphatic hydrocarbon group and R<2> -R<5> are each H or a substituent) is contained.
申请公布号 JP2002278020(A) 申请公布日期 2002.09.27
申请号 JP20010078682 申请日期 2001.03.19
申请人 FUJI PHOTO FILM CO LTD 发明人 KURUMA KOJI;EZOE TOSHIHIDE
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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