| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern quality examination method and a device which surely detects lack of patterns, such as characters, symbols, etc., formed by marking, printing, etc., and examining the quality of the pattern with high accuracy. SOLUTION: This pattern quality examination method, which examines the quality of the patterns such as the characters, symbols, etc., formed by marking, printing, etc., is provided with an imaging process imaging the patterns, so as to obtain picture signals, a contour extraction process processing the image signals and extracting the contour of the pattern, an angular change calculation process for calculating angular change in pixel rows forming the contour, a color tone difference image forming process for converting the angular change into the color tone difference and forming a color tone difference image, and a comparison process comparing the color tone difference image with a reference color tone difference image in the pattern. The quality of the pattern is examined, based on the comparison results of the comparison process. |
