MASK DEVELOPMENT PROCESSING METHOD FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a method for improving the heterogeneity of image characteristics of the upper part and lower part of the surface of a mask material for exposure as a method for advancing a process by holding the mask material for exposure almost perpendicularly and dipping it in processing tanks containing processing liquid one after another. SOLUTION: For a system in which the mask material for exposure is supported almost vertically and processed with liquid successively, this mask development processing method for exposure is characterized by that the elapsed time from dipping the material in previous-stage processing liquid to dipping it in trailing-stage processing liquid is different for different positions on the surface of the mask material for exposure.