| 摘要 |
PROBLEM TO BE SOLVED: To calibrate position detector with accuracy. SOLUTION: The image of a reference wafer SW for calibration, on which first reference marks (FSMa, FSMb and FSMc) including first marks (FTMa, FTMb and FTMc) having plural configuration feature points and second marks (STMa, STMb and STMc) for specifying the positions of the configurational feature points in the first marks (FTMa to FTMc) are formed is photographed with an imaging device which calibrates the position detector. Then the image magnification of the imaging device, the rotation amount of the imaging visual field of the device, center position of the visual field, etc., are calibrated with accuracy, by detecting the positions of a plurality of configurational feature points specified in the first marks (FTMa to FTMc) by means of the second marks (STMa to STMc). |
