METHOD FOR EXPOSURE, ORIGINAL GLASS FOR EXPOSURE, AND SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for exposure by which a plurality of patterns can be formed on a substrate without decreasing the acquired number of chips, and to provide raw glass for exposure and a substrate. SOLUTION: First original glass 10 has a circuit pattern 14, formed in its first exposure region 12 and an alignment pattern 15 formed in its second exposure region 13. Second original glass 20 has monitoring patterns 26a-26d formed in its second exposure region 23. After the first and second original glass 10 and 20 are prepared, a stepper exposes the first original glass 10 on a wafer in a matrix-like state by using the original glass 10. Then the stepper exposes the second original glass 20 on the wafer at every other positions, which are provided alternately with the exposure positions of the first original glass 10 by using the original glass 20.