| 摘要 |
A photosensitive composition includes a polymer having a polymerizable double bond on a side chain, a carboxyl-containing monomer as a copolymer component, organoboron salt and a hindered amine compound. The ethylene unsaturated compound is further included. The organoboron salt of formula (R<5>)(R<6>)B(R<7>)(R<8>) (I) includes a sensitization dye sensitizable in a wavelength area of 380 - 1300nm. A trihaloalkyl substituted compound is N-containing heterocyclic compound having trihalomethyl group or trihalomethyl sulfonyl compound. A photosensitive lithographic plate material uses the above-mentioned photosensitive composition. R5, R6, R7, R8 = optionally same as each other and alkyl, aryl, aralkyl, alkenyl, alkinyl, cycloalkyl or heterocyclic group, preferably, one of R1 - R4 is alkyl and the other substituents are aryl.
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