发明名称 |
POLISHING END POINT DETECTION FOR SUBSTRATE |
摘要 |
PURPOSE: To provide a technique that can detect a polishing end point with the use of a principle different from frictional force and light reflectance. CONSTITUTION: A two-dimensional image of a polished surface of a substrate is acquired, and the two-dimensional image is analyzed to compute entropies H1 and H2 of the two-dimensional image. The entropies H1 and H2 are used to determine a polishing end point of the substrate. The entropies H1 and H2 can be replaced with another image feature such as a difference statistic of the image. |
申请公布号 |
KR20020073386(A) |
申请公布日期 |
2002.09.26 |
申请号 |
KR20020013016 |
申请日期 |
2002.03.11 |
申请人 |
DAINIPPON SCREEN SEIJO K.K. |
发明人 |
FUJIMOTO HIROKI;IMAMURA ATSUSHI;NISHIHARA EIJI;SHIOMI JUNICHI |
分类号 |
B24B49/12;B24B37/013;G06T1/00;G06T7/00;G06T7/40;H01L21/304 |
主分类号 |
B24B49/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|