发明名称 |
Detection of contaminants on low wavelength masks |
摘要 |
Testing of a mask which is intended to be used for low wavelength lithography. At lower wavelengths, e.g., 157 nm, certain contaminants may become visible, even though they were transparent under visible or ultraviolet light. A combination of Raman spectroscopy and infrared absorption spectroscopy are used to identify the contaminants.
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申请公布号 |
US2002135759(A1) |
申请公布日期 |
2002.09.26 |
申请号 |
US20010817012 |
申请日期 |
2001.03.23 |
申请人 |
RAMAMOORTHY ARUN;DAO GIANG;GERTH CHRISTOPHER |
发明人 |
RAMAMOORTHY ARUN;DAO GIANG;GERTH CHRISTOPHER |
分类号 |
G01N21/65;G03F7/20;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/65 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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