发明名称 SYSTEM AND METHOD FOR MAKING THIN-FILM STRUCTURES USING A STEPPED PROFILE MASK
摘要 <p>A system and method for manufacturing thin-film structures disposed on a substrate(14). The thin-film structures have different respective thicknesses that vary along a radius of the substrate (14). A substrate (14) rotates about an axis of rotation and a source of deposited material is directed at the rotating substrate. A mask (20) having a stepped profile is positioned between the rotating substrate (14) and the source. The stepped mask (20) selectively blocks material emanating from the source from reaching the substrate. Each step of the profile of the mask (20) corresponds to one of the respective thicknesses of the thin-film structures. The radius along which the different respective thicknesses of the film-thin structures vary is measured from the axis of rotation of the rotating substrate.</p>
申请公布号 WO2002075016(A1) 申请公布日期 2002.09.26
申请号 US2002007638 申请日期 2002.03.13
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