发明名称 Method for topographical patterning of a device
摘要 The device of the present invention facilitates engaging mating elements, such as actuators used in disc drives, with a pattern on the device. The improved device includes arcuate edges between at least one of the sidewalls in the pattern and the surface of the device. The arcuate edges minimize some of the fracturing of the device that typically occurs when a mating element is inserted on or into the device. The present invention also relates to a method of fabricating a device. The method comprises positioning a mask in the form of a pattern relative to the device, and then etching the pattern into a surface on the device to form at least one sidewall and an arcuate edge such that the arcuate edge extends between the surface on the device and one of the sidewalls.
申请公布号 US2002135266(A1) 申请公布日期 2002.09.26
申请号 US20010905037 申请日期 2001.07.13
申请人 BOUTAGHOU ZINE EDDINE 发明人 BOUTAGHOU ZINE EDDINE
分类号 B81C1/00;C04B41/53;C04B41/91;G11B5/48;H02N2/00;(IPC1-7):H02N2/00 主分类号 B81C1/00
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