发明名称 |
Tri-layer dielectric fuse cap for laser deletion |
摘要 |
A substrate having at least one fuse in a fuse layer. An upper etch-stop layer over the fuse, a lower etch-stop layer having a different etch-chemistry over the fuse and, optionally, a diffusion barrier layer immediately over the fuse. The lower etch-stop later and the optional diffusion barrier providing a uniform passivation thickness for use in conjunction with laser fuse deletion processes. An upper etch-resistant layer over the lower etch-resistant layer and having an etch chemistry selective to that of the lower etch-resistant layer. Methods for providing a uniform passivation thickness over all the fuses, and for deleting such fuses.
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申请公布号 |
US2002135043(A1) |
申请公布日期 |
2002.09.26 |
申请号 |
US20010816278 |
申请日期 |
2001.03.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
MCDEVITT THOMAS L.;STAMPER ANTHONY K. |
分类号 |
H01L23/525;(IPC1-7):H01L29/00 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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