发明名称 Tri-layer dielectric fuse cap for laser deletion
摘要 A substrate having at least one fuse in a fuse layer. An upper etch-stop layer over the fuse, a lower etch-stop layer having a different etch-chemistry over the fuse and, optionally, a diffusion barrier layer immediately over the fuse. The lower etch-stop later and the optional diffusion barrier providing a uniform passivation thickness for use in conjunction with laser fuse deletion processes. An upper etch-resistant layer over the lower etch-resistant layer and having an etch chemistry selective to that of the lower etch-resistant layer. Methods for providing a uniform passivation thickness over all the fuses, and for deleting such fuses.
申请公布号 US2002135043(A1) 申请公布日期 2002.09.26
申请号 US20010816278 申请日期 2001.03.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MCDEVITT THOMAS L.;STAMPER ANTHONY K.
分类号 H01L23/525;(IPC1-7):H01L29/00 主分类号 H01L23/525
代理机构 代理人
主权项
地址