发明名称 |
Volatile organometallic complexes suitable for use in chemical vapor depositions on metal oxide films |
摘要 |
Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.
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申请公布号 |
US2002136832(A1) |
申请公布日期 |
2002.09.26 |
申请号 |
US20020150561 |
申请日期 |
2002.05.21 |
申请人 |
FIRST SOLAR, LLC, A DELAWARE CORPORATION |
发明人 |
GIOLANDO DEAN M. |
分类号 |
C03C17/245;(IPC1-7):C23C16/00;C07F7/22;C07F3/06 |
主分类号 |
C03C17/245 |
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地址 |
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