发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device comprises a semiconductor body (1) which is provided at a surface (2) with a non-volatile memory cell comprising a source (3) and a drain (4), and an access gate (14) which is electrically insulated from a gate structure (8) comprising a control gate (9), the gate structure (8) being electrically insulated from the semiconductor body (1) by a gate dielectric (11, 25). The gate dielectric (11, 25) is provided with a charge-storage region wherein data in the form of electric charge can be stored. The access gate (14) has a substantially flat surface portion (17) extending substantially parallel to the surface (2) of the semiconductor body (1) and has the shape of a block which is disposed against the gate structure (8) without overlapping the gate structure (8).
申请公布号 US2002137290(A1) 申请公布日期 2002.09.26
申请号 US20010980510 申请日期 2001.11.02
申请人 WILS NICOLE ANNE HELENA FREDDY;SLOTBOOM MICHIEL;WIDDERSHOVEN FRANCISCUS PETRUS 发明人 WILS NICOLE ANNE HELENA FREDDY;SLOTBOOM MICHIEL;WIDDERSHOVEN FRANCISCUS PETRUS
分类号 H01L21/28;H01L21/336;H01L21/8246;H01L21/8247;H01L27/10;H01L27/115;H01L29/41;H01L29/423;H01L29/49;H01L29/788;H01L29/792;(IPC1-7):H01L21/336 主分类号 H01L21/28
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