发明名称 |
Semiconductor laser device and method for fabricating same |
摘要 |
A semiconductor laser device including an InP-based substrate, and a laser structure overlying said InP-based substrate and configured to form a ridge stripe, said laser structure having a plurality of compound semiconductor layers including at least one selectively-oxidized layer forming a current confinement structure, said selectively-oxidized layer including a pair of Al-oxidized peripheral areas and a non-oxidized central area sandwiched therebetween and forming a current path for said laser structure. The semiconductor laser device has a reduced threshold current and excellent lasing characteristics by the function of the oxidized layer or a current blocking layer.
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申请公布号 |
US2002136253(A1) |
申请公布日期 |
2002.09.26 |
申请号 |
US20010811454 |
申请日期 |
2001.03.20 |
申请人 |
THE FURUKAWA ELECTRIC CO., LTD. |
发明人 |
IWAI NORIHIRO;SHIMIZU HITOSHI;MUKAIHARA TOSHIKAZU;KASUKAWA AKIHIKO |
分类号 |
H01S5/00;H01S5/22;H01S5/223;H01S5/227;H01S5/343;(IPC1-7):H01S5/00 |
主分类号 |
H01S5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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