发明名称 Semiconductor laser device and method for fabricating same
摘要 A semiconductor laser device including an InP-based substrate, and a laser structure overlying said InP-based substrate and configured to form a ridge stripe, said laser structure having a plurality of compound semiconductor layers including at least one selectively-oxidized layer forming a current confinement structure, said selectively-oxidized layer including a pair of Al-oxidized peripheral areas and a non-oxidized central area sandwiched therebetween and forming a current path for said laser structure. The semiconductor laser device has a reduced threshold current and excellent lasing characteristics by the function of the oxidized layer or a current blocking layer.
申请公布号 US2002136253(A1) 申请公布日期 2002.09.26
申请号 US20010811454 申请日期 2001.03.20
申请人 THE FURUKAWA ELECTRIC CO., LTD. 发明人 IWAI NORIHIRO;SHIMIZU HITOSHI;MUKAIHARA TOSHIKAZU;KASUKAWA AKIHIKO
分类号 H01S5/00;H01S5/22;H01S5/223;H01S5/227;H01S5/343;(IPC1-7):H01S5/00 主分类号 H01S5/00
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