| 发明名称 |
Process of cleaning semiconductor processing, handling and manufacturing equipment |
| 摘要 |
A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.
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| 申请公布号 |
US6454869(B1) |
申请公布日期 |
2002.09.24 |
| 申请号 |
US20010893206 |
申请日期 |
2001.06.27 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COTTE JOHN MICHAEL;GOLDFARB DARIO L.;MCCULLOUGH KENNETH JOHN;MOREAU WAYNE MARTIN;POPE KEITH R.;SIMONS JOHN P.;TAFT CHARLES J. |
| 分类号 |
B08B7/00;C11D1/00;C11D3/18;C11D3/24;C11D3/37;C11D11/00;G03F7/42;H01L21/00;H01L21/306;(IPC1-7):B08B3/04 |
主分类号 |
B08B7/00 |
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