发明名称 EXHAUST GAS CLEANING APPARATUS FOR CHEMICAL LIQUID TANK
摘要 <p>PROBLEM TO BE SOLVED: To provide an exhaust gas cleaning apparatus for a chemical liquid tank which prevents air pollution by decreasing the size of bubbles formed by exhaust gas, increasing the contact area between treatment liquid and the bubbles, and dissolving chemical liquid components in the exhaust gas efficiently in the treatment liquid even when bubbles of large diameters are generated by the pressure variation of the exhaust gas. SOLUTION: The exhaust gas cleaning apparatus 10 has a container 14 in which a constant amount of the treatment liquid W is stored, an exhaust gas introduction part 21 for introducing the exhaust gas generated when the chemical liquid is injected into the chemical liquid tank 30, and an exhaust part 16 for discharging clean air from which the chemical liquid components is removed from the container 14. The exhaust gas introduction part 21 has an immersed pipe part 25 which is immersed in the treatment liquid W in the container 14, and a great number of aeration parts 26 for dispersing/releasing the exhaust gas introduced into the exhaust gas introduction part 21 in the treatment liquid W are formed around the immersed pipe part 25.</p>
申请公布号 JP2002273153(A) 申请公布日期 2002.09.24
申请号 JP20010084558 申请日期 2001.03.23
申请人 TAKATA CORP 发明人 NAKANO KOICHI;MAEDA HIROMI
分类号 B01D53/34;B01D53/18;B01D53/77;(IPC1-7):B01D53/34 主分类号 B01D53/34
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