发明名称 Apparatus for removing contaminant particles on a photomask
摘要 An apparatus for removing undesired particles on a target object comprises an electrostatic charge inductor for attracting the undesired particles on the target object, an electrostatic charge developer coming into contact with the electrostatic charge inductor, and a driving source for rotating the electrostatic charge developer. The electrostatic charge developer is rotated by the driving source to be rubbed by the electrostatic charge inductor, which in turn charges the electrostatic charge inductor with negative electricity. The charged inductor attracts the undesired particles off the target object, thereby removing the undesired particles therefrom.
申请公布号 US6453496(B1) 申请公布日期 2002.09.24
申请号 US20000625009 申请日期 2000.07.25
申请人 ANAM SEMICONDUCTOR, INC. 发明人 LEE BYUNG CHUL
分类号 G11B23/50;H01L21/00;(IPC1-7):A47L13/40;A47L25/00 主分类号 G11B23/50
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