发明名称 Defect inspection apparatus and method by comparing two pairs of areas adjacent to one another
摘要 A Time Delayed Integrator (TDI) sensor obtains images of a plurality of areas with the same pattern of an object of inspection such as a semiconductor wafer, and the obtained images are stored in an image storage part. The plurality of areas are designated in airs, and an image comparison part compares the images of the areas in each pair to detect a suspected pair including at least one possible defective area. A central processing unit (CPU) compares the images of the areas in the suspected pair with images of areas in other pairs to thereby find which area in the suspected pair is defective.
申请公布号 US6456318(B1) 申请公布日期 2002.09.24
申请号 US19990294147 申请日期 1999.04.20
申请人 TOKYO SEIMITSU CO., LTD. 发明人 NOGUCHI SYUN
分类号 G01B11/30;G01N21/88;G01N21/95;G01N21/956;(IPC1-7):H04N7/18 主分类号 G01B11/30
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