发明名称 Two-piece chuck
摘要 A two-piece chuck for supporting a substrate in which a base plate allows the wafer to tilt and also exposes the underside of the wafer during wash/rinse cycle as well as during load/unload operations.
申请公布号 US6454864(B2) 申请公布日期 2002.09.24
申请号 US19990332213 申请日期 1999.06.14
申请人 CUTEK RESEARCH, INC. 发明人 WYTMAN JOSEPH
分类号 H01L21/68;H01L21/687;(IPC1-7):C23C16/00 主分类号 H01L21/68
代理机构 代理人
主权项
地址