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发明名称
Two-piece chuck
摘要
A two-piece chuck for supporting a substrate in which a base plate allows the wafer to tilt and also exposes the underside of the wafer during wash/rinse cycle as well as during load/unload operations.
申请公布号
US6454864(B2)
申请公布日期
2002.09.24
申请号
US19990332213
申请日期
1999.06.14
申请人
CUTEK RESEARCH, INC.
发明人
WYTMAN JOSEPH
分类号
H01L21/68;H01L21/687;(IPC1-7):C23C16/00
主分类号
H01L21/68
代理机构
代理人
主权项
地址
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