发明名称 |
Backside heating chamber for emissivity independent thermal processes |
摘要 |
An apparatus that includes a reflector having a mirrored surface facing down, a glass structure located beneath the reflector, a susceptor within the glass structure having a surface facing up that is capable of holding a part to be processed, and one or more radiant heat sources directed at and located beneath the glass structure.
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申请公布号 |
US6455814(B1) |
申请公布日期 |
2002.09.24 |
申请号 |
US20010007852 |
申请日期 |
2001.11.07 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SAMOILOV ARKADII V.;DUBOIS DALE R.;SCUDDER LANCE A.;COMITA PAUL B.;WASHINGTON LORI D.;CARLSON DAVID K.;ANDERSON ROGER N. |
分类号 |
C23C16/48;C30B25/10;H01L21/00;(IPC1-7):F27B5/14 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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