发明名称 Ferromagnetic double quantum well tunnel magneto-resistance device
摘要 A ferromagnetic double quantum well tunneling magnetoresistance device is disclosed that utilizes a two-dimensional electron (positive hole) system to obtain an infinitely great magnetoresistance ratio. Also disclosed are a sensitive magnetic sensor and a nonvolatile storage device derived from that device. In structural terms of the device, a first and a second quantum well layer of ferromagnetic material (4, 8) in each of which the quantum confinement for carriers is established in a two-dimensional electron (positive hole) state are each sandwiched between a pair of barrier layers of nonmagnetic material (2, 6, 10) through which the carriers can tunnel. The first and second quantum well layers (4, 8) have a difference in coercive force so that when an external magnetic field is applied thereto only one of them may be reversed in the direction of magnetization. As a result, if magnetizations of the two quantum wells are parallel to each other, tunneling is allowed to occur, and if they are antiparallel to each other, tunneling is inhibited. A infinitely great tunneling magnetoresistance ratio is thereby obtained.
申请公布号 US6456523(B1) 申请公布日期 2002.09.24
申请号 US20010762804 申请日期 2001.02.13
申请人 JAPAN SCIENCE AND TECHNOLOGY CORPORATION 发明人 TANAKA MASAAKI;HAYASHI TOSHIAKI
分类号 H01L43/08;G01R33/06;G01R33/09;G11B5/39;G11C11/16;H01F10/32;H01L21/8246;H01L27/22;(IPC1-7):G11C11/00 主分类号 H01L43/08
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