发明名称 |
Method of reducing stop layer loss in a photoresist stripping process using a fluorine scavenger |
摘要 |
A method of stripping a photoresist layer in a plasma derived from an etch gas for the photoresist and a fluorine-containing polymer includes a scavenging gas for fluorine in the resist strip etch plasma. The scavenger for flourine reduces the amount of fluorine released from a fluorine-containing polymer into the resist etch plasma during polymer dissociation in the photoresist stripping step, thereby providing a photoresist stripping mechanism with reduced stop layer loss.
|
申请公布号 |
US6455232(B1) |
申请公布日期 |
2002.09.24 |
申请号 |
US19980059850 |
申请日期 |
1998.04.14 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LIN JASON;JENQ STEFAN;OU-YANG ERIC;TSAI GILBERT |
分类号 |
G03F7/42;H01L21/311;(IPC1-7):G03F7/36;H01L21/461;H01L21/467;C23F1/12 |
主分类号 |
G03F7/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|