发明名称 POSITIVE TYPE RADIATION-SENSITIVE MIXTURE
摘要 PURPOSE: Provided is a positive type radiation-sensitive mixture, which is developed in an aqueous alkaline solution, has a stable acid latent image, is useful for the production of semiconductors, and has high sensitivity to short-wavelength UV region. CONSTITUTION: The positive type radiation-sensitive mixture essentially comprises: (a) a binder which is insoluble in water and is soluble in an aqueous alkaline solution; (b) a compound having at least one acid-liable bond; (c) a compound capable of generating an acid by exposure to radiation; and (d1) a basic ammonium compound, or (d2) a basic sulfonium compound. Particularly, component (b) has at least one acid-liable C-O-C or C-N-C bond.
申请公布号 KR100355254(B1) 申请公布日期 2002.09.23
申请号 KR19940002535 申请日期 1994.02.14
申请人 CLARIANT FINANCE (BVI) LTD. 发明人 GEORG PAWLOWSKI;KKAUS JUERGEN PRZYBILLA;KUDO TAKANORI;MASUDA SELYA;KINOSHITA YOSHIAKI;SUEHIRO NATSUMI;MUNIRATHANA PADMANABAN;OKAZAKI HIROSHI;ENDO HAJIME;RALPH DAMMEL
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/004 主分类号 G03F7/004
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