发明名称 METHOD AND APPARATUS FOR CONTROLLING EXPOSURE PROCESS AND MANUFACTURING APPARATUS THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a method for controlling an exposure process by which a manufacturing line 11 can be operated efficiently as a whole by automatically controlling the order of processing the kinds of materials to be processed in the exposure process in an optimal order. SOLUTION: Information in the manufacturing line 11 having at least a film-forming process, the exposure process and an etching process is obtained. A manufacturing condition in the manufacturing line 11 is simulated based on the obtained information. A plan for changing the kinds of materials in the exposure process is made based on the simulated manufacturing condition. The exposure process is controlled based on the plan for changing the kinds of materials. This makes it possible to automatically control the order of processing the kinds of materials to be processed in the exposure process in the optimal order and thus to operate the manufacturing line 11 efficiently as a whole.
申请公布号 JP2002270482(A) 申请公布日期 2002.09.20
申请号 JP20010062154 申请日期 2001.03.06
申请人 TOSHIBA CORP;TOSHIBA IT SOLUTION CORP 发明人 YAMADA TAKASHI;MASUDA KAZUYOSHI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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