MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which efficiently crystallizes a semiconductor film by a short time heat treatment and getters a catalyst element used for the crystallization, without deforming a substrate in a semiconductor device manufacturing process using a low heat- resistive substrate such as glass. SOLUTION: The heat treatment comprises a step for controlling an optical source in a pulse manner to irradiate a semiconductor film therewith, thus efficiently heat treating the semiconductor film for a short time. This prevents the heat damage caused to a substrate.