SUBSTRATE-PROCESSING APPARATUS AND SYSTEM THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of using a large amount of gas instantaneously without enlarging factory facilities. SOLUTION: Each of frameworks of an indexer 10 and a main body 20 that constitute the substrate processing apparatus 1 is constituted by a combination of frame 11. The frame 11 is made of a square hollow metallic prism. The main body 20 is provided with a processing unit using a large amount of air instantaneously. A pressure accumulating tank 30 is provided in a dead space produced by the frames 11 or in the frame 11 and in the middle of a pipeline for introducing air into the processing unit from an air supply source of the factory. When the processing unit uses a large amount of air instantaneously, air is supplied at a large flow rate to the processing unit from the pressure-accumulating tank 30. As a result, a large amount of gas can be used instantaneously without enlarging factory facilities.