| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for easily manufacturing a transparent conductive film in an irregular shape having light-scattering effect. SOLUTION: After a thin-film semiconductor layer 3 is formed, a flat transparent conductive film 4a is formed on the thin-film semiconductor film 3 by the sputtering method, the surface of the formed rear surface transparent conductive film is dipped into a dilute hydrochloric acid or a dilute acetic acid, and at the same time ultraviolet rays are selectively applied to the surface.</p> |
