POLISHING SLURRY

摘要

PROBLEM TO BE SOLVED: To provide polishing slurry that can quickly perform polishing at stable polishing speed after polishing even if the amount of supply to the polishing cloth of a polishing apparatus becomes small. SOLUTION: The polishing slurry should contain a polishing abrasive. Viscosity should be at least 2 mPa.sec at a shear rate of 100/sec when shear stress is applied onto the polishing cloth. The amount of decrease in viscosity to original viscosity when the shear rate is changed from 100/sec to 500/sec should be 10% or more.