| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a position detecting method and an exposure method which executes alignment with high precision and improves the throughput. SOLUTION: The position detecting method comprises a step of detecting the positions and the heights of a plurality of marks formed on a substrate 1 to obtain a first measurement result using a first detecting means (position detector 2), a step of moving the substrate 1 to an aligner 3 and detecting the position and the height of at least one mark to obtain a second measurement result using a second position detecting means, a step of obtaining the position and the height of other mark on the substrate 1 by the aligner 3 based on the first and second measurement results, and a step of determining a plurality of exposure regions on the substrate 1 based on the positions and the heights of the plurality of marks on the substrate 1 by the aligner 3. The exposure method comprises a step of exposing the exposure regions in addition.</p> |
