PLASMA CVD APPARATUS, PLASMA CVD METHOD AND THIN FILM SOLAR CELL

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus in which deposition rate can be enhanced when a film is deposited on a substrate. SOLUTION: The plasma CVD system for forming a film on a substrate 13 carried into a film deposition chamber 4-6 comprises a holder 14 being driven to carry the substrate while holding, pipes 23 and 24 for supplying a material gas to the film deposition chamber, a high frequency electrode 21 disposed in the film deposition chamber and conducted while facing the substrate to generate plasma in the film deposition chamber, and upper and lower earth members 61 and 62 for earthing the holder by touching it under a state where at least the substrate faces the electrode.