发明名称 SEMICONDUCTOR MANUFACTURING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To simultaneously inspect a semiconductor wafer, while performing a semiconductor manufacturing process with respect to the semiconductor wafer. SOLUTION: A plurality of semiconductor wafer as a unit are installed in a semiconductor manufacturing apparatus 1, each semiconductor wafer being subjected to a semiconductor manufacturing process, and any one of the semiconductor wafers after subjected to the semiconductor manufacturing process is externally extracted from a position 5 different from a position 3 at which the plural wafers were installed in the apparatus 1, and the extracted semiconductor wafer is inspected. When the wafer is decided as being acceptable, the wafer is again returned into the apparatus 1 from the position 5 different from the position 3, and returned wafer is returned to the position 3, together with the other semiconductor wafers by plural number, after completion subjected to the semiconductor manufacturing process.
申请公布号 JP2002270667(A) 申请公布日期 2002.09.20
申请号 JP20010069136 申请日期 2001.03.12
申请人 SONY CORP 发明人 MAKITA TOSHIYUKI
分类号 H01L21/66;H01L21/00;H01L21/205;H01L21/677;(IPC1-7):H01L21/68 主分类号 H01L21/66
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