发明名称 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR LASER ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a laser element in which a resonance face is formed in a nitride semiconductor grown on a sapphire substrate difficult to cleave and a laser beam having an elliptical far field pattern is obtained. SOLUTION: The method for manufacturing a laser element comprises a first step for growing a nitride semiconductor layer on a sapphire substrate and forming an n-type layer, an active layer and a p-type layer thereon such that the nitride semiconductor layer has a total film thickness of 6μm or above and then exposing the surface of the n-type layer by etching to make a resonance face, and a second step for dividing the sapphire substrate by setting a dividing position, between the opposite resonance faces formed continuously by etching and between the resonance faces of one and the other laser elements, closely to one resonance face such that a part including the substrate projecting from the resonance face does not intercept laser light emitted from the resonance face.
申请公布号 JP2002270968(A) 申请公布日期 2002.09.20
申请号 JP20020034969 申请日期 2002.02.13
申请人 NICHIA CHEM IND LTD 发明人 SUGIMOTO YASUNOBU;NAKAMURA SHUJI
分类号 H01S5/323;H01S5/343;(IPC1-7):H01S5/323 主分类号 H01S5/323
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