SYSTEM AND METHOD FOR PRODUCING SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide a system and a method for producing a semiconductor in which the treating characteristics can be controlled in response to variation. SOLUTION: According to a relation correlating the monitor results and the wafer temperature, a monitor value under treatment is compared with a past monitor value for successful treatment and temperature of the wafer 1 is controlled to minimize the shift of the monitor values. Variation in the treating characteristics can thereby be monitored and the treating characteristics can be controlled in response to variation.