| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a coating film, with which an inorganic-material coating film can be formed at low cost by making the film- quality adjustment possible simultaneously with deposition without requiring high-temperature annealing process for film-quality adjustment after the deposition, and to provide an apparatus therefor. SOLUTION: An inorganic-material coating film is formed on the surface of a member 5 to be processed by heating a deposition material liquid. The apparatus for forming the coating film comprises a stage 15 on which the member 5 is loaded in an operation chamber 10, a deposition material-liquid supply means 22 that supplies the deposition material liquid into the operation chamber 10, a reaction-gas supply means 24 that supplies reaction gas into the operation chamber 10, an irradiating means 30 that irradiates the reaction gas supplied into the operation chamber 10 with an electron beam, and a heating means 17 that heats the member.
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