发明名称 GAIN IMPROVED HETEROJUNCTION BIPOLAR TRANSISTOR USING THIN GALLIUM ARSENIDE ANTIMONY LAYER FOR BASE, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a heterojunction bipolar transistor which can obtain high current gain, while maintaining a high operation frequency, and its manufactur ing method. SOLUTION: This heterojunction bipolar transistor (100) is a heterojunction bipolar transistor (100), containing a collector (104), an emitter (114) and a base (110), positioned between the collector (104) and the emitter (114), and the base (110) contains a gallium arsenide antimony (GaAsSb) layer having a thickness of less than 49 nm.
申请公布号 JP2002270616(A) 申请公布日期 2002.09.20
申请号 JP20020050005 申请日期 2002.02.26
申请人 AGILENT TECHNOL INC 发明人 MOLL NICOLAS J;BOLOGNESI COLOMBO R
分类号 H01L21/331;H01L29/08;H01L29/10;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L21/331
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