| 摘要 |
<p>A system and method of minimizing stress related to the ramp rate of variable by limiting the ramp rate as a function of the current value of the variable is provided (10, 14, 14, 22, 26). More specifically, the present invention provides a system and method of maintaining the radial delta temperature of a semiconductor substrate or other heated body below the crystal slip curve by dynamically controlling the temperature ramp rate during processing.</p> |
