发明名称 |
SYSTEM AND METHOD FOR PERFORMING SPUTTER DEPOSITION USING A DIVERGENT ION BEAM SOURCE AND A ROTATING SUBSTRATE |
摘要 |
A system for performing sputter disposition on a substrate. A divergent ion current source generates a divergent ion beam. The ion current source has a central axis about which ions are directed toward a surface of a negatively biased target. A rotating substrate is positioned proximate to the target. The central axis of the ion current source is normal to the surface of the target and parallel to a deposition surface of the rotating substrate.
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申请公布号 |
US2002130031(A1) |
申请公布日期 |
2002.09.19 |
申请号 |
US20020138143 |
申请日期 |
2002.05.02 |
申请人 |
4WAVE, INC. |
发明人 |
BALDWIN DAVID ALAN;HYLTON TODD LANIER |
分类号 |
C23C14/46;C23C14/50;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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