SHADOW MASK AND METHOD FOR PRODUCING A SHADOW MASK
摘要
The invention relates to a shadow mask for particle rays, particularly ion rays comprising a silicon chip with a pattern therein, characterised in that the silicon chip has a metal coating on the side orientated towards the incident ion rays which stops said rays and dissipates heat. Also, disclosed is a method for producing the shadow mask.
申请公布号
WO0214951(A3)
申请公布日期
2002.09.19
申请号
WO2001EP09405
申请日期
2001.08.14
申请人
UNIVERSITAET GESAMTHOCHSCHULE KASSEL;MEIJER, JAN;STEPHAN, ANDREAS;WEIDENMUELLER, ULF;RANGELOW, IVO
发明人
MEIJER, JAN;STEPHAN, ANDREAS;WEIDENMUELLER, ULF;RANGELOW, IVO