发明名称 FLUORINATED AROMATIC ACETAL POLYMERS AND PHOTOSENSITIVE COMPOSITIONS CONTAINING SUCH POLYMERS
摘要 A novel fluorinated aromatic acetal polymer comprises at least one unit of A and at least one unit of B or C, or at least one unit of each of A, B and C and optionally further comprises at least one unit of either D or E or at least one unit of each of D and E, wherein the units A and B and/or C, and optionally D and/or E are linked together by single covalent C-C bonds and have the formulae (A), (B), (C), (D) and (E), wherein RA is H or C1-C11 alkyl, or an aryl group that does not contain fluorine, and RB and RC are an aryl groups that contains fluorine. The polymer is prepared by reacting a hydrolyzed polyvinyl acetate polymer or copolymer with at least one non-fluorinated aldehyde component, and at least one fluorinated aromatic component. The polymer is useful is preparing a photosensitive composition which comprises at least one diazo resin and at least one such fluorinated aromatic acetal polymer. Such a photosensitive composition may be applied to a support to form an imageable member which may be imaged to form a lithographic printing plates.
申请公布号 WO02073315(A1) 申请公布日期 2002.09.19
申请号 WO2002US04402 申请日期 2002.02.14
申请人 KODAK POLYCHROME GRAPHICS COMPANY, LTD. 发明人 PLATZER, STEPHAN;PERRON, PAUL;ALDEN, MELINDA
分类号 C08F8/18;G03F7/004;G03F7/021;(IPC1-7):G03F7/021;C08F8/00 主分类号 C08F8/18
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