| 发明名称 |
METHOD AND EVAPORATING SOLUTION FOR RINSING A DEVELOPED PHOTORESIST LAYER |
| 摘要 |
A method of developing a photoresist layer (30) on a semiconductor wafer (22) in a developing chamber (20) includes applying a developer to the photoresist layer (30), applying an evaporating solution (32) to the photoresist layer (30), and drying the wafer (22). |
| 申请公布号 |
WO02073677(A1) |
申请公布日期 |
2002.09.19 |
| 申请号 |
WO2002US07747 |
申请日期 |
2002.03.14 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
BABCOCK, CARL, P. |
| 分类号 |
G03F7/32;B05D7/00;G03F7/30;G03F7/38;H01L21/027;H01L21/311 |
主分类号 |
G03F7/32 |
| 代理机构 |
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代理人 |
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