METHOD OF DETERMINING MAINTENANCE TIME FOR SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PURPOSE: A method for determining a maintenance time for a semiconductor manufacturing apparatus is provided to decide proper maintenance time by improving a maintenance time determining method. CONSTITUTION: In a method of judging a maintenance time for a semiconductor manufacturing apparatus in which a treatment is carried out by the use of corrosive gas in a reaction chamber(112), a water content inside the reaction chamber(112) is measured with a moisture meter connected to the reaction chamber(112), when processing is carried out with corrosive gas, and a maintenance time for the semiconductor manufacturing apparatus is decided corresponding to a water content change, when corrosive gas processing is carried out repeatedly.