发明名称 METHODS FOR THE LITHOGRAPHIC DEPOSITION OF MATERIALS CONTAINING NANOPARTICLES
摘要 A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.
申请公布号 WO0209884(A3) 申请公布日期 2002.09.19
申请号 WO2001CA01094 申请日期 2001.07.30
申请人 SIMON FRASER UNIVERSITY 发明人 HILL, ROSS, H.;BRAVO-VASQUEZ, JUAN, PABLO
分类号 C01G11/02;C23C2/04;C23C2/26;C23C8/02;C23C18/06;C23C18/08;C23C18/12;C23C18/14;C23C24/08;C23C26/00;C23C26/02;C23C30/00;G03F7/004;H01L21/316;H05K1/16;H05K3/10 主分类号 C01G11/02
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