发明名称 Semiconductor integrated circuit device with reduced cross-talk and method for fabricating same
摘要 The present invention provides a semiconductor integrated circuit device comprising a digital circuit and an analog circuit on a common substrate wherein a substrate effect constant of the analog circuit is at least less than a substrate effect constant of the digital circuit and wherein the analog circuit further comprises a P type polysilicon gate electrode for a nMOSFET and a N type polysilicon gate electrode for a pMOSFET.
申请公布号 US2002130369(A1) 申请公布日期 2002.09.19
申请号 US20010925956 申请日期 2001.08.10
申请人 IWASAKI TAKAYUKI;TAKEUCHI YUSUKE;WATANABE ATSUO 发明人 IWASAKI TAKAYUKI;TAKEUCHI YUSUKE;WATANABE ATSUO
分类号 H01L27/04;H01L21/762;H01L21/822;H01L21/8238;H01L27/092;(IPC1-7):H01L29/76 主分类号 H01L27/04
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