发明名称 |
Semiconductor integrated circuit device with reduced cross-talk and method for fabricating same |
摘要 |
The present invention provides a semiconductor integrated circuit device comprising a digital circuit and an analog circuit on a common substrate wherein a substrate effect constant of the analog circuit is at least less than a substrate effect constant of the digital circuit and wherein the analog circuit further comprises a P type polysilicon gate electrode for a nMOSFET and a N type polysilicon gate electrode for a pMOSFET.
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申请公布号 |
US2002130369(A1) |
申请公布日期 |
2002.09.19 |
申请号 |
US20010925956 |
申请日期 |
2001.08.10 |
申请人 |
IWASAKI TAKAYUKI;TAKEUCHI YUSUKE;WATANABE ATSUO |
发明人 |
IWASAKI TAKAYUKI;TAKEUCHI YUSUKE;WATANABE ATSUO |
分类号 |
H01L27/04;H01L21/762;H01L21/822;H01L21/8238;H01L27/092;(IPC1-7):H01L29/76 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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