发明名称 |
POSITIVE TYPE PHOTOSENSITIVE COMPOSITION |
摘要 |
PURPOSE: To provide a positive type photosensitive composition having high resolving power when a bracelet illumination lamp is used, having a broad defocus latitude, less liable to produce a side lobe in pattern formation using a halftone phase shift mask and less liable to generate particles in storage with age. CONSTITUTION: The positive type photosensitive composition contains a compound which generates a 2-4C fluorine substituted alkanesulfonic acid when irradiated with active light or radiation, a resin having a specified alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased when decomposed by the action of the acid, a basic compound and a fluorine- and/or silicon-containing surfactant.
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申请公布号 |
KR20020073095(A) |
申请公布日期 |
2002.09.19 |
申请号 |
KR20020013291 |
申请日期 |
2002.03.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
AOAI TOSHIAI;KODAMA KUNIHIKO |
分类号 |
C08K5/02;C08K5/16;C08K5/42;C08K5/54;C08L101/00;C23F1/02;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
C08K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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