发明名称 POSITIVE TYPE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE: To provide a positive type photosensitive composition having high resolving power when a bracelet illumination lamp is used, having a broad defocus latitude, less liable to produce a side lobe in pattern formation using a halftone phase shift mask and less liable to generate particles in storage with age. CONSTITUTION: The positive type photosensitive composition contains a compound which generates a 2-4C fluorine substituted alkanesulfonic acid when irradiated with active light or radiation, a resin having a specified alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased when decomposed by the action of the acid, a basic compound and a fluorine- and/or silicon-containing surfactant.
申请公布号 KR20020073095(A) 申请公布日期 2002.09.19
申请号 KR20020013291 申请日期 2002.03.12
申请人 FUJI PHOTO FILM CO., LTD. 发明人 AOAI TOSHIAI;KODAMA KUNIHIKO
分类号 C08K5/02;C08K5/16;C08K5/42;C08K5/54;C08L101/00;C23F1/02;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 C08K5/02
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