| 发明名称 |
Positive photoresist composition |
| 摘要 |
A composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of a compound represented by the following formula: and (C) a compound represented by the following formula: This composition is a positive photoresist composition that is excellent in sensitivity and definition and causes less shrink.
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| 申请公布号 |
US2002132178(A1) |
申请公布日期 |
2002.09.19 |
| 申请号 |
US20020035137 |
申请日期 |
2002.01.04 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KURIHARA MASAKI;SUZUKI TAKAKO;MARUYAMA KENJI;NIIKURA SATOSHI;DOI KOUSUKE |
| 分类号 |
G03F7/039;G03F7/022;(IPC1-7):G03F7/023;G03F7/30 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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